DocumentCode
792166
Title
Compositionally separated microstructure of Co-Cr films prepared by electron-cyclotron-resonance plasma sputtering
Author
Hirono, Shigeru ; Igarashi, Masaru ; Koshimoto, Yasuhiro ; Maeda, Yasushi
Author_Institution
NTT Interdisciplinary Res. Lab., Tokyo, Japan
Volume
31
Issue
6
fYear
1995
fDate
11/1/1995 12:00:00 AM
Firstpage
2812
Lastpage
2814
Abstract
Compositional separation (CS) has been observed to occur in Co-Cr based alloy thin films grown at elevated substrate temperatures. This CS produces fine Co-enriched regions within grains, which are expected to give a magnetic microstructure suitable for high-density recording. We studied the compositional microstructure in Co-Cr films grown by electron-cyclotron-resonance plasma (ECR) sputtering with a view to reducing media noise and increasing recording density. ECR sputtering produced fine grains which supported particularly small and closely packed Co-enriched regions (less than 5 nm spacing) at elevated substrate temperature. This compositional microstructure is finer than that of RF-sputtered Co-Cr films. ECR sputtering simultaneously improves the magnetic properties and refines the compositional microstructure
Keywords
chromium alloys; cobalt alloys; ferromagnetic materials; magnetic recording; magnetic thin films; sputtered coatings; Co-Cr; Co-Cr thin films; compositional microstructure; compositional separation; electron-cyclotron-resonance plasma sputtering; grain structure; high-density recording; magnetic properties; noise; substrate temperature; Magnetic films; Magnetic noise; Magnetic properties; Magnetic recording; Micromagnetics; Microstructure; Noise reduction; Plasma density; Plasma temperature; Sputtering;
fLanguage
English
Journal_Title
Magnetics, IEEE Transactions on
Publisher
ieee
ISSN
0018-9464
Type
jour
DOI
10.1109/20.490160
Filename
490160
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