Effect of etching wall profile on TPC flying height

Author

Cha, Ellis ; Lee, Jerry J K

Author_Institution

Conner Peripherals, San Jose, CA, USA

Volume

31

Issue

6

fYear

1995

fDate

11/1/1995 12:00:00 AM

Firstpage

2958

Lastpage

2960

Abstract

The effect of the flying height on the TPC wall profile is studied. The different etching techniques to form the TPC steps create different wall profiles. The wall profiles are measured using an AFM. By employing the numerical technique developed for the sub-ambient pressure sliders the wall profile can be modeled correctly. The resulting modeled flying heights show very good agreement with the measured flying heights. The flying heights are less sensitive to the wall length and wall height; thus, the flying heights are less susceptible to the measurement uncertainties

Keywords

atomic force microscopy; hard discs; magnetic recording; sputter etching; AFM; RIE; TPC flying height; air bearing surface; etching techniques; etching wall profile; flying height susceptibility; ion milling; magnetic rigid disk drives; numerical technique; subambient pressure sliders; transverse pressure contour sliders; wall height; wall length; Atomic force microscopy; Difference equations; Disk drives; Etching; Finite difference methods; Manufacturing; Measurement uncertainty; Milling; Numerical stability; Rails;

fLanguage

English

Journal_Title

Magnetics, IEEE Transactions on

Publisher

ieee

ISSN

0018-9464

Type

jour

DOI

10.1109/20.490202

Filename

490202