Nanopatterning with interferometric lithography using a compact λ=46.9-nm laser

Author

Capeluto, Maria G. ; Vaschenko, Georgiy ; Grisham, Michael ; Marconi, Mario C. ; Ludueña, S. ; Pietrasanta, L. ; Lu, Yunfeng ; Parkinson, Bruce ; Menoni, Carmen S. ; Rocca, J.J.

Author_Institution

Dept. de Fisica, Univ. de Buenos Aires, Argentina

Volume

5

Issue

1

fYear

2006

Firstpage

3

Lastpage

7

Abstract

We report the imprinting of nanometer-scale gratings by interferometric lithography at λ=46.9 nm using an Ne-like Ar capillary discharge laser. Gratings with periods as small as 55 nm were imprinted on poly-methyl methacrylate using a Lloyd´s mirror interferometer. This first demonstration of nanopatterning using an extreme ultraviolet (EUV) laser illustrates the potential of compact EUV lasers in nanotechnology applications.

Keywords

diffraction gratings; gas lasers; light interferometers; nanolithography; nanopatterning; polymers; ultraviolet lithography; 46.9 nm; 55 nm; Lloyds mirror interferometer; Ne-like Ar capillary discharge laser; extreme ultraviolet laser; interferometric lithography; nanometer-scale gratings; nanopatterning; nanotechnology; polymethyl methacrylate; Argon; Coherence; Fault location; Gratings; Interference; Interferometric lithography; Nanopatterning; Nanotechnology; Ultraviolet sources; X-ray lasers; Nanotechnology; X-ray lasers; X-ray lithography; photolithography;

fLanguage

English

Journal_Title

Nanotechnology, IEEE Transactions on

Publisher

ieee

ISSN

1536-125X

Type

jour

DOI

10.1109/TNANO.2005.858599

Filename

1576730