DocumentCode
792876
Title
Is there light at the end of the road for optical lithography?
Author
Levinson, Harry J.
Author_Institution
Adv. Micro Devices Inc., Sunnyvale, CA, USA
Volume
18
Issue
4
fYear
2002
fDate
7/1/2002 12:00:00 AM
Firstpage
50
Lastpage
58
Abstract
As optical lithography nears its physical limits, this article discusses the 2001 ITRS update to the lithography roadmap and reviews the possible next-generation lithography technologies outlined in that update.
Keywords
integrated circuit technology; photolithography; 2001 ITRS Update; lithography roadmap; next-generation technologies; optical lithography; physical limits; Integrated circuit technology; Lithography; Nonhomogeneous media; Optical films; Optical materials; Random access memory; Reflectivity; Resists; Silicon compounds; Ultraviolet sources;
fLanguage
English
Journal_Title
Circuits and Devices Magazine, IEEE
Publisher
ieee
ISSN
8755-3996
Type
jour
DOI
10.1109/MCD.2002.1021122
Filename
1021122
Link To Document