• DocumentCode
    792876
  • Title

    Is there light at the end of the road for optical lithography?

  • Author

    Levinson, Harry J.

  • Author_Institution
    Adv. Micro Devices Inc., Sunnyvale, CA, USA
  • Volume
    18
  • Issue
    4
  • fYear
    2002
  • fDate
    7/1/2002 12:00:00 AM
  • Firstpage
    50
  • Lastpage
    58
  • Abstract
    As optical lithography nears its physical limits, this article discusses the 2001 ITRS update to the lithography roadmap and reviews the possible next-generation lithography technologies outlined in that update.
  • Keywords
    integrated circuit technology; photolithography; 2001 ITRS Update; lithography roadmap; next-generation technologies; optical lithography; physical limits; Integrated circuit technology; Lithography; Nonhomogeneous media; Optical films; Optical materials; Random access memory; Reflectivity; Resists; Silicon compounds; Ultraviolet sources;
  • fLanguage
    English
  • Journal_Title
    Circuits and Devices Magazine, IEEE
  • Publisher
    ieee
  • ISSN
    8755-3996
  • Type

    jour

  • DOI
    10.1109/MCD.2002.1021122
  • Filename
    1021122