• DocumentCode
    793021
  • Title

    Fabrication and Operating Characteristics of Ion-Implanted Bubble Memory Chips for a 16M-Bit Device

  • Author

    Ohashi, M. ; Betsui, K. ; Satoh, Y. ; Furukawa, N. ; Namiki, T. ; Komenou, K.

  • Author_Institution
    Fujitsu Laboratories Ltd.
  • Volume
    4
  • Issue
    3
  • fYear
    1989
  • fDate
    3/1/1989 12:00:00 AM
  • Firstpage
    178
  • Lastpage
    183
  • Abstract
    A test chip using ion-implanted functions for a 16-Mbit bubble memory device has been designed, fabricated and characterized. A new delineation process for ion-implanted tracks using SiO2 ion-implantation masks is effective for reducing defects in minor loops. As a result, a bias margin of 22 Oe was obtained for minor loop bubble propagation. Test chip operation over a wide temperature range, from ¿25°C to 80°C, has been realized.
  • Keywords
    Chip scale packaging; Detectors; Fabrication; Magnetics Society; Memory; Research and development; Temperature dependence; Temperature distribution; Testing; Tracking loops;
  • fLanguage
    English
  • Journal_Title
    Magnetics in Japan, IEEE Translation Journal on
  • Publisher
    ieee
  • ISSN
    0882-4959
  • Type

    jour

  • DOI
    10.1109/TJMJ.1989.4563988
  • Filename
    4563988