DocumentCode
794408
Title
Soft Magnetic Properties of Multilayered Fe-2~4 at% Si Films
Author
Sugenoya, S. ; Okayama, H. ; Narumiya, Y.
Author_Institution
TDK Corp.
Volume
5
Issue
7
fYear
1990
fDate
7/1/1990 12:00:00 AM
Firstpage
590
Lastpage
596
Abstract
Fe-3.4 at% Si/Si3 N4 multilayer films were prepared by rf sputtering. Soft magnetic properties were obtained when intermediate layers (SiNx ) were deposited in an Ar+N2 atmosphere and had a composition ratio (N/Si) of about 4/3. Interestingly, these films retain a low coercivity of about 2 Oe after annealing (at 600°C for 2 hrs), while Fe-3.4 at% Si/SiO2 multilayer films show a high coercivity of more than 5 Oe after annealing under identical conditions. It was confirmed that Si3 N4 layers prevent grain growth in magnetic layers more effectively than do SiO2 layers at high temperatures. It was also confirmed that multilayer structures of Fe-3.4 at% Si/Si3 N4 are more thermally stable than are those of Fe-3.4 at% Si/SiO2 .
Keywords
Annealing; Atmosphere; Coercive force; Magnetic films; Magnetic multilayers; Magnetic properties; Semiconductor films; Silicon compounds; Soft magnetic materials; Sputtering;
fLanguage
English
Journal_Title
Magnetics in Japan, IEEE Translation Journal on
Publisher
ieee
ISSN
0882-4959
Type
jour
DOI
10.1109/TJMJ.1990.4564147
Filename
4564147
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