Measurement of very low magnetostrictions in thin films

Author

Rengarajan, S. ; Lee, B.H. ; Choe, G. ; Walser, R.M.

Author_Institution

I/UCR Center for Magnetics, Texas Univ., Austin, TX, USA

Volume

31

Issue

6

fYear

1995

fDate

11/1/1995 12:00:00 AM

Firstpage

3391

Lastpage

3393

Abstract

A highly sensitive optical interferometer with in-situ calibration was developed to measure the low-field magnetostriction of magnetic thin films using the cantilever beam technique, The high displacement resolution (0.01 Å) of this instrument permits the measurement of magnetostrictions of 10^-9. First measurements on a soft CoFeSiB thin film were made to demonstrate this technique. The magnetostriction measurement resolution of 5×10 obtained is the lowest yet reported value. The dynamic range of the technique was demonstrated in measurements of a magnetostriction greater than 10^-5

Keywords

light interferometry; magnetic thin films; magnetic variables measurement; magnetostriction; soft magnetic materials; CoFeSiB; calibration; cantilever beam; displacement resolution; dynamic range; magnetic thin films; magnetostriction measurement; optical interferometer; soft CoFeSiB thin film; Calibration; Displacement measurement; Instruments; Magnetic films; Magnetostriction; Optical films; Optical interferometry; Optical sensors; Structural beams; Transistors;

fLanguage

English

Journal_Title

Magnetics, IEEE Transactions on

Publisher

ieee

ISSN

0018-9464

Type

jour

DOI

10.1109/20.490392

Filename

490392