Title :
UV-induced index change in hydrogen-free germane-silicate waveguides
Author :
Jarvis, R.A. ; Love, J.D. ; Durandet, A. ; Conway, G.D. ; Boswell, R.W.
Author_Institution :
Res. Sch. of Phys. Sci. & Eng., Australian Nat. Univ., Canberra, ACT, Australia
fDate :
3/14/1996 12:00:00 AM
Abstract :
The authors present the first report of an induced refractive index change in germane-silicate glass containing no detectable levels of hydrogen. The single layer waveguide was deposited on a silicon wafer by helicon activated reactive evaporation (HARE), and following exposure to 193 nm UV from an excimer laser, an absolute decrease of 0.006 in refractive index was measured. The dopant level of germanium is estimated to be -15% (mol)
Keywords :
germanate glasses; optical glass; optical waveguides; refractive index; vacuum deposited coatings; 193 nm; GeO2-SiO2; UV exposure; dopant level; excimer laser; helicon activated reactive evaporation; hydrogen-free germane-silicate glass; refractive index; silicon wafer; single layer waveguide;
Journal_Title :
Electronics Letters
DOI :
10.1049/el:19960314
