DocumentCode
795611
Title
UV-induced index change in hydrogen-free germane-silicate waveguides
Author
Jarvis, R.A. ; Love, J.D. ; Durandet, A. ; Conway, G.D. ; Boswell, R.W.
Author_Institution
Res. Sch. of Phys. Sci. & Eng., Australian Nat. Univ., Canberra, ACT, Australia
Volume
32
Issue
6
fYear
1996
fDate
3/14/1996 12:00:00 AM
Firstpage
550
Lastpage
552
Abstract
The authors present the first report of an induced refractive index change in germane-silicate glass containing no detectable levels of hydrogen. The single layer waveguide was deposited on a silicon wafer by helicon activated reactive evaporation (HARE), and following exposure to 193 nm UV from an excimer laser, an absolute decrease of 0.006 in refractive index was measured. The dopant level of germanium is estimated to be -15% (mol)
Keywords
germanate glasses; optical glass; optical waveguides; refractive index; vacuum deposited coatings; 193 nm; GeO2-SiO2; UV exposure; dopant level; excimer laser; helicon activated reactive evaporation; hydrogen-free germane-silicate glass; refractive index; silicon wafer; single layer waveguide;
fLanguage
English
Journal_Title
Electronics Letters
Publisher
iet
ISSN
0013-5194
Type
jour
DOI
10.1049/el:19960314
Filename
490466
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