Laterally coupled DBR laser emitting at 1.55 μm fabricated by focused ion beam lithography

Author

Bach, L. ; Rennon, S. ; Reithmaier, J.P. ; Forchel, A. ; Gentner, J.L. ; Goldstein, L.

Author_Institution

Technische Phys., Wurzburg Univ., Germany

Volume

14

Issue

8

fYear

2002

Firstpage

1037

Lastpage

1039

Abstract

By using focused ion beam lithography high performance 1.55-μm emitting distributed Bragg reflector lasers were realized suitable for high-speed optical telecommunication. Threshold currents of 8 mA and continuous-wave efficiencies of 0.37 W/A for 600-μm-long devices were achieved. Stable single-mode emission with sidemode suppression ratios of > 40 dB were observed for the entire operation range. By relative intensity noise measurements an intrinsic 3-dB modulation frequency of > 10 GHz was estimated for a single-mode output power of 23 mW.

Keywords

chemical beam epitaxial growth; distributed Bragg reflector lasers; focused ion beam technology; frequency modulation; integrated optics; ion beam lithography; ion implantation; laser modes; laser noise; optical communication equipment; optical fabrication; optical modulation; quantum well lasers; rapid thermal annealing; waveguide lasers; 1.55 micron; 23 mW; 8 mA; FIB implantation; WDM source; bandgap shift; compressively strained; continuous-wave efficiencies; focused ion beam lithography; four quantum-well structure; frequency modulation response; gas-source molecular beam epitaxy; high performance lasers; high slope efficiency; high-speed optical telecommunication; intrinsic modulation frequency; laterally coupled DBR laser; monolithic integration; rapid thermal annealing; relative intensity noise; ridge waveguide depth; sidemode suppression ratios; single-mode output power; stable single-mode emission; threshold currents; Distributed Bragg reflectors; Frequency estimation; High speed optical techniques; Ion beams; Laser noise; Lithography; Optical coupling; Optical modulation; Particle beam optics; Stimulated emission;

fLanguage

English

Journal_Title

Photonics Technology Letters, IEEE

Publisher

ieee

ISSN

1041-1135

Type

jour

DOI

10.1109/LPT.2002.1021961

Filename

1021961