Fabrication of multiwavelength simultaneous monitoring device using arrayed-waveguide grating

Author

Okamoto, K. ; Hattori, K. ; Ohmori, Y.

Author_Institution

NTT Opto-Electron. Labs., Ibaraki, Japan

Volume

32

Issue

6

fYear

1996

fDate

3/14/1996 12:00:00 AM

Firstpage

569

Lastpage

570

Abstract

The authors demonstrate a novel multiwavelength simultaneous monitoring (MSM) device using silica-based arrayed-waveguide grating (AWG). In the present MSM device, the spectral transmission loss characteristics of the two diffraction beams are devised to cross at the signal wavelength. It is applicable to the unequally spaced WDM systems aiming at the suppression of four-wave mixing problems. The slope coefficient of the discrimination curve was ~0.94 dB/GHz and the monitoring range was ±0.37 nm in the fabricated MSM for use in 8 ch unequally spaced WDM systems

Keywords

diffraction gratings; multiwave mixing; optical communication equipment; optical fabrication; optical losses; optical waveguides; wavelength division multiplexing; arrayed-waveguide grating; diffraction beams; discrimination curve; four-wave mixing; monitoring range; multiwavelength simultaneous monitoring device fabrication; signal wavelength; silica-based arrayed-waveguide grating; spectral transmission loss characteristics; unequally spaced WDM systems;

fLanguage

English

Journal_Title

Electronics Letters

Publisher

iet

ISSN

0013-5194

Type

jour

DOI

10.1049/el:19960379

Filename

490479