Title :
Fabrication of High Precision Self-Aligned V-Grooves Integrated on Silica-on-Silicon Chips
Author :
Yaocheng Shi ; Lei Zhang ; Pengxin Chen ; Sailing He
Author_Institution :
State Key Lab. of Modern Opt. Instrum., Zhejiang Univ., Hangzhou, China
Abstract :
In this letter, we propose a simple method to fabricate V-grooves integrated on silica-on-silicon chips. We have utilized the photolithographic self-alignment principle to form the etching mask for V-grooves during waveguide core etching. With such designed processes, the waveguides and V-grooves can be fabricated without any lateral displacement.
Keywords :
elemental semiconductors; etching; integrated optoelectronics; masks; optical design techniques; optical fabrication; optical waveguides; photolithography; silicon; silicon compounds; SiO2-Si; etching mask; high precision self-aligned V-grooves; photolithographic self-alignment principle; silica-on-silicon chips; waveguide core etching; Etching; Optical fiber devices; Optical fibers; Photonics; Silicon; Silicon compounds; Silica-on-silicon; V-groove; self-aligned; waveguide;
Journal_Title :
Photonics Technology Letters, IEEE
DOI :
10.1109/LPT.2014.2316800
