DocumentCode :
79578
Title :
Fabrication of High Precision Self-Aligned V-Grooves Integrated on Silica-on-Silicon Chips
Author :
Yaocheng Shi ; Lei Zhang ; Pengxin Chen ; Sailing He
Author_Institution :
State Key Lab. of Modern Opt. Instrum., Zhejiang Univ., Hangzhou, China
Volume :
26
Issue :
12
fYear :
2014
fDate :
15-Jun-14
Firstpage :
1169
Lastpage :
1171
Abstract :
In this letter, we propose a simple method to fabricate V-grooves integrated on silica-on-silicon chips. We have utilized the photolithographic self-alignment principle to form the etching mask for V-grooves during waveguide core etching. With such designed processes, the waveguides and V-grooves can be fabricated without any lateral displacement.
Keywords :
elemental semiconductors; etching; integrated optoelectronics; masks; optical design techniques; optical fabrication; optical waveguides; photolithography; silicon; silicon compounds; SiO2-Si; etching mask; high precision self-aligned V-grooves; photolithographic self-alignment principle; silica-on-silicon chips; waveguide core etching; Etching; Optical fiber devices; Optical fibers; Photonics; Silicon; Silicon compounds; Silica-on-silicon; V-groove; self-aligned; waveguide;
fLanguage :
English
Journal_Title :
Photonics Technology Letters, IEEE
Publisher :
ieee
ISSN :
1041-1135
Type :
jour
DOI :
10.1109/LPT.2014.2316800
Filename :
6798653
Link To Document :
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