DocumentCode :
797312
Title :
Advances in Linear Modeling of Microwave Transistors
Author :
Landa, Andrés Zárate-de ; Zúñiga-Juárez, José Eleazar ; Loo-Yau, José Raúl ; Reynoso-Hernández, J. Apolinar ; Maya-Sánchez, María Del Carmen ; Del Valle-Padilla, Juan Luis
Author_Institution :
Centre de Investig. Cienc. y de Educ. Super. de Ensenada (CICESE), Ensenada
Volume :
10
Issue :
2
fYear :
2009
fDate :
4/1/2009 12:00:00 AM
Abstract :
Heterojunction field effect transistors (HFET) based on gallium nitride (AlGaN/GaN) and metal semiconductor field effect transistors (MESFETs) based on silicon carbide (SiC) are the preferred transistors for high-power amplifier circuit designs rather than MESFETs, high electron mobility transistors (HEMTs) and pseudomorphic HEMTs based on gallium arsenide (GaAs) or indium phosphide (InP) semiconductor technology. While AlGaN/GaN and SiC are good candidates for high-power applications, GaAs and InP semiconductor technologies are the preferred transistors in low-power, low-voltage, and low-noise applications [1].
Keywords :
III-V semiconductors; Schottky gate field effect transistors; gallium arsenide; high electron mobility transistors; indium compounds; microwave transistors; semiconductor device models; silicon compounds; AlGaN-GaN; GaAs; InP; SiC; heterojunction field effect transistors; high electron mobility transistors; high-power amplifier; metal semiconductor field effect transistors; microwave transistors; Aluminum gallium nitride; Gallium arsenide; Gallium nitride; HEMTs; Indium phosphide; MESFETs; MODFETs; Microwave FETs; Microwave transistors; Silicon carbide;
fLanguage :
English
Journal_Title :
Microwave Magazine, IEEE
Publisher :
ieee
ISSN :
1527-3342
Type :
jour
DOI :
10.1109/MMM.2008.931675
Filename :
4906382
Link To Document :
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