• DocumentCode
    797932
  • Title

    Anisotropic ECR etching of benzocyclobutene

  • Author

    Shul, R.J. ; Sullivan, C.T. ; McClellan, G.B.

  • Author_Institution
    Sandia Nat. Labs., Albuquerque, NM, USA
  • Volume
    31
  • Issue
    22
  • fYear
    1995
  • fDate
    10/26/1995 12:00:00 AM
  • Firstpage
    1919
  • Lastpage
    1921
  • Abstract
    Anisotropic, high rate etching of benzocyclobutene (BCB) with smooth surfaces and sidewalls has been achieved in a SF6/O 2/Ar electron cyclotron resonance (ECR)-generated plasma. BCB sidewall profiles, etch rates, and selectivity to photoresist are evaluated against SF6:O2 ratio, pressure, microwave power, and RF power
  • Keywords
    integrated optics; optical fabrication; optical waveguides; polymer films; sputter etching; Ar; ECR-generated plasma; O2; SF6; SF6-O2-Ar; anisotropic ECR etching; benzocyclobutene; electron cyclotron resonance; etch rates; high rate etching; optical waveguide fabrication; selectivity; sidewall profiles;
  • fLanguage
    English
  • Journal_Title
    Electronics Letters
  • Publisher
    iet
  • ISSN
    0013-5194
  • Type

    jour

  • DOI
    10.1049/el:19951321
  • Filename
    490660
    • Link To Document
    https://search.isc.ac/dl/search/defaultta.aspx?DTC=49&DC=797932