• DocumentCode
    798059
  • Title

    Magnetic Properties of Amorphous CoNbZr/AlN Multilayered Films

  • Author

    Ohnuma, S. ; Hayashide, M. ; Matsumoto, F. ; Fujimori, H.

  • Author_Institution
    Amorophous Magnetic Devices Laboratory.
  • Volume
    6
  • Issue
    5
  • fYear
    1991
  • fDate
    5/1/1991 12:00:00 AM
  • Firstpage
    382
  • Lastpage
    388
  • Abstract
    The dependence of the magnetic properties of multilayer CoNbZr/AlN films on the conditions of film preparation was investigated. AlN films were prepared by N2 reactive sputtering deposition on CoNbZr films. The soft magnetic properties of the as-deposited films were found to be strongly related to the rf input power during AlN deposition. The anisotropy field decreases drastically at an input power of greater than 2 W/cm2, and a high permeability of around 10,000 (at 5 MHz) was obtained for as-deposited films prepared at an rf input power during A1N deposition of 4.4 W/cm2. SEM observations revealed that CoNbZr films in as-deposited multilayer form have nearly the same morphology as amorphous alloy films annealed at the optimum temperature for reduction of the anisotropy field. The annealing process during film preparation (self-annealing effect) is attributed to the heat generated during AlN deposition, originating mainly in the heat of formation in AlN reactive sputtering.
  • Keywords
    Amorphous materials; Anisotropic magnetoresistance; Annealing; Magnetic films; Magnetic multilayers; Magnetic properties; Morphology; Nonhomogeneous media; Permeability; Sputtering;
  • fLanguage
    English
  • Journal_Title
    Magnetics in Japan, IEEE Translation Journal on
  • Publisher
    ieee
  • ISSN
    0882-4959
  • Type

    jour

  • DOI
    10.1109/TJMJ.1991.4565172
  • Filename
    4565172