• DocumentCode
    798098
  • Title

    Effect of thermal treatment on Rayleigh scattering in silica-based glasses

  • Author

    Tsujikawa, K. ; Ohashi, M. ; Shiraki, K. ; Tateda, M.

  • Author_Institution
    NTT Access Network Syst. Labs., Ibaraki, Japan
  • Volume
    31
  • Issue
    22
  • fYear
    1995
  • fDate
    10/26/1995 12:00:00 AM
  • Firstpage
    1940
  • Lastpage
    1941
  • Abstract
    The effect of thermal treatment on Rayleigh scattering in silica-based glasses is investigated experimentally. Two types of sample glasses, such as `annealed samples´ and `reheated samples´, were prepared by the VAD method with different types of thermal treatment. The authors found that the Rayleigh scattering coefficient of the reheated samples was 5~10% greater than that of the annealed samples because heating up to 1800°C increases the disorder in the SiO4 glass network structure
  • Keywords
    Rayleigh scattering; annealing; heat treatment; optical fibre losses; optical glass; silicon compounds; 1800 C; Rayleigh scattering; SiO4 glass network structure; VAD method; annealed samples; reheated samples; scattering coefficient; silica-based glasses; thermal treatment;
  • fLanguage
    English
  • Journal_Title
    Electronics Letters
  • Publisher
    iet
  • ISSN
    0013-5194
  • Type

    jour

  • DOI
    10.1049/el:19951331
  • Filename
    490674
    • Link To Document
    https://search.isc.ac/dl/search/defaultta.aspx?DTC=49&DC=798098