• DocumentCode
    798405
  • Title

    Imprcved Fast Neutron Tolerance of GaAs JFET´s Operating in the Hot Electron Range

  • Author

    McNichols, J.L. ; Zuleeg, R.

  • Author_Institution
    McDonnell Douglas Astronautics Company, Western Division Santa Monica, California
  • Volume
    18
  • Issue
    2
  • fYear
    1971
  • fDate
    4/1/1971 12:00:00 AM
  • Firstpage
    110
  • Lastpage
    113
  • Abstract
    The fast neutron induced degradation of the electrical characteristics of n-channel GaAs junction field effect transistors (JFET´s) operating in the Shockley mode (thermal equilibrium) was estimated previously. Advances in technology have led to the fabrication of devices with micron sized channel lengths which are capable of response at microwave frequencies. Short channel lengths, however, result in device operation under thermal nonequilibrium conditions and hot electron effects must be considered. The theory of Lehovec and Zuleeg, which provides the characteristics for JFET´s operating in the hot electron range, is employed in this paper to estimate the neutron degradation of these devices. It is shown that JFET´s operating in the hot electron range are more resistant to neutron exposure than are JFET´s operating in the Shockley region. Devices with channel doping concentration of 1017 cm-3 are predicted to survive fluences of 1016 neutrons/cm2. Some preliminary test results are reported.
  • Keywords
    Doping; Electric variables; Electrons; FETs; Fabrication; Gallium arsenide; Microwave frequencies; Microwave technology; Neutrons; Thermal degradation;
  • fLanguage
    English
  • Journal_Title
    Nuclear Science, IEEE Transactions on
  • Publisher
    ieee
  • ISSN
    0018-9499
  • Type

    jour

  • DOI
    10.1109/TNS.1971.4325942
  • Filename
    4325942