Effects of High Deposition Rate on Perpendicular Magnetic Recording Media Prepared by SPT Target

A new sputtering source, called an SPT target, has been proposed, aimed at improvement of systems for continuous sputtering of Co-Cr double-layer perpendicular recording media. A very low discharge voltage was realized compared with sputtering source targets for magnetic media so far proposed. Both permalloy and Co-Cr films deposited using an SPT target had high crystal orientation even when fabricated at high deposition rates. High through-put (base film feed rates) during permalloy and Co-Cr layer deposition resulted in media with excellent recording density response, including a high 2nd peak ratio and D50* value. It was shown that the new SPT target is suitable for obtaining high through put in magnetic recording medium production.