DocumentCode :
799655
Title :
Soft Magnetic Properties for Fe-B Films Sputtered in Ar+N2 Plasma
Author :
Shimatsu, T. ; Sakai, Y. ; Takahashi, M. ; Wakiyama, T. ; Hiraga, K.
Author_Institution :
Tohoku University.
Volume :
7
Issue :
2
fYear :
1992
Firstpage :
103
Lastpage :
112
Abstract :
Fe-B films sputtered in Ar+N2 plasma were investigated in order to obtain film with high initial permeability. Importance was placed on elucidation of the relation between the initial permeability ¿i and parameters of the film structure such as the phase, grain size, and lattice strain. Fe-B (1 to 4 at% B) films sputtered in Ar+5%N2 plas-ma exhibit a high ¿i of about 2000 after annealing at 400 °C, and about 1000 after annealing at 500 °C. The results of X-ray and electron diffraction patterns indicate that films with high ¿i consist of the ¿ phase. By comparing this with results for Fe-N films, it is suggested that the high ¿i of Fe-B-N films is caused by the reduction of grain sizes and induced lattice strain, as well as other metallurgical structures such as in homogeneities.
Keywords :
Annealing; Capacitive sensors; Electrons; Grain size; Lattices; Magnetic films; Magnetic properties; Permeability; Plasma properties; X-ray diffraction;
fLanguage :
English
Journal_Title :
Magnetics in Japan, IEEE Translation Journal on
Publisher :
ieee
ISSN :
0882-4959
Type :
jour
DOI :
10.1109/TJMJ.1992.4565341
Filename :
4565341
Link To Document :
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