DocumentCode
801443
Title
Microprocessor-Based Control of an Ion Beam Deposition System
Author
Ahn, Jaeshin ; Stromsmoe, Keith A. ; Lawson, Ronald P.W.
Author_Institution
The Department of Electrical Engineering, University of Alberta, Edmonton, Alta., Canada.
Issue
4
fYear
1985
Firstpage
405
Lastpage
409
Abstract
A microprocessor-based system with 32 A/D, 24 D/A, and 16 ac load controllers, has been designed and built to monitor and control an ion beam thin-film deposition system. The A/D and D/A channels have electrical isolation of 7.5 kV between channels and between input and output. The microprocessor system keeps the ion beam deposition parameters stable for extended periods of operation and it is proposed as a means to greatly simplify switching from one deposition species to another to grow thin multilayer or alloy films.
Keywords
Acceleration; Communication system control; Control systems; Data acquisition; Ion beams; Ion sources; Microprocessors; Nonhomogeneous media; Power supplies; Sputtering;
fLanguage
English
Journal_Title
Industrial Electronics, IEEE Transactions on
Publisher
ieee
ISSN
0278-0046
Type
jour
DOI
10.1109/TIE.1985.350117
Filename
4158662
Link To Document