• DocumentCode
    801455
  • Title

    Internal Stress for Sputtered Sendust Films

  • Author

    Ishiwata, N. ; Shinkai, S. ; Urai, H.

  • Author_Institution
    NEC Corporation.
  • Volume
    7
  • Issue
    11
  • fYear
    1992
  • Firstpage
    867
  • Lastpage
    871
  • Abstract
    It has become clear that the internal stress (¿) of thermally treated sendust films changes depending on the treatment temperature, the thermal expansion coefficient (¿) of the substrate, and the film oxygen content. The measured value for low-oxygen-content sendust film is 169×10¿7. Values of calculated using the value of for Sendust film show good agreement with measured values.
  • Keywords
    Annealing; Internal stresses; Magnetic films; Magnetostriction; Stress measurement; Substrates; Temperature; Tensile stress; Thermal expansion; Thermal stresses;
  • fLanguage
    English
  • Journal_Title
    Magnetics in Japan, IEEE Translation Journal on
  • Publisher
    ieee
  • ISSN
    0882-4959
  • Type

    jour

  • DOI
    10.1109/TJMJ.1992.4565521
  • Filename
    4565521
    • Link To Document
    https://search.isc.ac/dl/search/defaultta.aspx?DTC=49&DC=801455