DocumentCode
802002
Title
Stray Magnetic Field Measurements for Shadow Mask Holes and Their Effects on the Electron Trajectory
Author
Suzuki, H. ; Haga, A. ; Nasuno, H. ; Fujimura, T. ; Yamane, K.
Author_Institution
Tohoku Gakuin University.
Volume
8
Issue
2
fYear
1993
Firstpage
96
Lastpage
101
Abstract
A shadow mask consists of a thin iron sheet with numerous electron beam through-holes. When a CRT is subjected to an environmental magnetic field, the shadow mask is magnetized and a stray magnetic field is created at the holes. The resulting Lorentz force causes deflection of the electron beam when it travels through the holes. The stray magnetic field strength near a shadow mask was measured using a SEM (scanning electron microscope). The stray magnetic field strength near a stripe hole was 16.3 times greater than the environmental field. In order to determine the influence of the stray field, we calculated the electron beam defrection. The stray field causes only slight miss-landing, defined as the displacement of the beam´s contact on the screen from that without stray field.
Keywords
Cathode ray tubes; Charge carrier processes; Electron beams; Iron; Magnetic field measurement; Magnetic fields; Magnetic force microscopy; Magnetics Society; Phosphors; Scanning electron microscopy;
fLanguage
English
Journal_Title
Magnetics in Japan, IEEE Translation Journal on
Publisher
ieee
ISSN
0882-4959
Type
jour
DOI
10.1109/TJMJ.1993.4565580
Filename
4565580
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