Title :
Grating writing model for materials with nonlinear photosensitive response
Author :
Besley, James A. ; Reekie, Laurence ; Weeks, Conan ; Wang, Teresa ; Murphy, Collette
Author_Institution :
Sch. of Phys., Sydney Univ., NSW, Australia
Abstract :
Presents a model for the growth of grating devices in materials with a nonlinear photosensitive response to incident radiation. We derive an expression for the written refractive index modulation in the material in terms of this photosensitive response and the incident fluence profile along the device. We investigate the validity of the model experimentally using gratings written in two optical fibers with very different photosensitivity response functions. These gratings are characterized both spatially and spectrally, through direct measurements of the refractive index modulation and the analysis of the spectral filter response. The results show good agreement with the model. We extend the analysis to show how to compensate for the nonlinear material response in order to achieve a desired grating design in a given material. This compensation method is used to improve the performance of a dispersion flattened grating device to display both high bandwidth utilization and low group delay ripple over the reflection band.
Keywords :
diffraction gratings; nonlinear optics; optical fibre dispersion; optical filters; photorefractive materials; compensation method; direct measurements; dispersion flattened grating device; grating design; grating devices; grating writing model; high bandwidth utilization; incident fluence profile; incident radiation; low group delay ripple; nonlinear photosensitive response materials; photosensitive response; photosensitivity response functions; reflection band; refractive index modulation; spatial characterization; spectral characterization; spectral filter response; two optical fibers; written refractive index modulation; Bandwidth; Displays; Fiber gratings; Optical fiber dispersion; Optical fiber filters; Optical fibers; Optical materials; Refractive index; Spectral analysis; Writing;
Journal_Title :
Lightwave Technology, Journal of
DOI :
10.1109/JLT.2003.818177