Title :
Strained-layer 1.5 mu m wavelength InGaAs/InP multiple quantum well lasers grown by chemical beam epitaxy
Author :
Tsang, W.T. ; Wu, M.C. ; Yang, L. ; Chen, Y.K. ; Sergent, A.M.
Author_Institution :
AT&T Bell Lab., Murray Hill, NJ, USA
Abstract :
A substantial reduction is reported in the threshold current densities for 1.5 mu m wavelength InxGa1-xAs/InxGa1-xAs1-yPy strained-layer multiple quantum well (SL-MQW) lasers over lattice-matched MQW lasers. Threshold current density was found to depend sensitively on the InAs content x and thickness d of the InxGa1-xAs quantum wells. Threshold current densities as low as 370 A/cm2 and internal quantum efficiency of 90% were obtained for separate confinement heterostructure Sl-MQW lasers having four quantum wells and with x=0.65 and d=5 nm. Such a threshold current density is among the lowest values obtained thus far for 1.5 mu m wavelength InGaAs/InGaAsP MQW lasers. The present lasers were grown by chemical beam epitaxy.
Keywords :
III-V semiconductors; chemical beam epitaxial growth; gallium arsenide; gallium compounds; indium compounds; laser transitions; semiconductor junction lasers; 1.5 micron; 90 percent; InGaAs-InGaAsP; MQW lasers; chemical beam epitaxy; internal quantum efficiency; multiple quantum well; semiconductor lasers; separate confinement heterostructure; strained-layer; threshold current densities;
Journal_Title :
Electronics Letters
DOI :
10.1049/el:19901313