DocumentCode :
803386
Title :
Electric field domains in p-Si/SiGe quantum cascade structures
Author :
Ikonic, Zoran ; Harrison, Paul ; Kelsall, Robert W.
Author_Institution :
Sch. of Electron. & Electr. Eng., Univ. of Leeds, UK
Volume :
53
Issue :
2
fYear :
2006
Firstpage :
189
Lastpage :
195
Abstract :
The formation of domains in quantum cascade structures is one of the mechanisms strongly affecting the operation of quantum cascade lasers, quantum-well infrared detectors, and other devices. In this paper, we consider the problem of domain formation in p-doped Si/SiGe quantum cascades, using a carrier scattering transport framework. In effect, the hole flow along the cascade is described via scattering between quantized states belonging to neighboring periods, caused by phonons, alloy disorder, and carrier-carrier interactions. The generation of either periodic or of nonperiodic domains is studied in uniformly doped cascades, as well as the influence of modulation doping of cascades on the domain formation.
Keywords :
Ge-Si alloys; electrical conductivity; elemental semiconductors; hole mobility; interface phonons; interface states; semiconductor doping; semiconductor materials; semiconductor quantum wells; silicon; Si-SiGe; carrier scattering transport; electric field domain formation; hole flow; modulation doping; p-doped quantum cascades; quantum cascade structures; semiconductor doping; Acoustic scattering; Germanium silicon alloys; Light scattering; Optical scattering; Particle scattering; Quantum cascade lasers; Quantum well lasers; Resonance light scattering; Resonant tunneling devices; Silicon germanium; Domain formation; SiGe; quantum cascade structures;
fLanguage :
English
Journal_Title :
Electron Devices, IEEE Transactions on
Publisher :
ieee
ISSN :
0018-9383
Type :
jour
DOI :
10.1109/TED.2005.862498
Filename :
1580853
Link To Document :
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