DocumentCode
803561
Title
The effects of pulse plating parameters on copper plating distribution of microvia in PCB manufacture
Author
Yung, K.C. ; Yue, T.M. ; Chan, K.C. ; Yeung, K.F.
Author_Institution
Dept. of Ind. & Syst. Eng., Hong Kong Polytech.s Univ., Kowloon, China
Volume
26
Issue
2
fYear
2003
fDate
4/1/2003 12:00:00 AM
Firstpage
106
Lastpage
109
Abstract
The introduction of microvias to printed circuit boards has revolutionized the entire printed circuit board (PCB) industry. In many instances, the plating of microvias creates a bottleneck in the manufacture of high-density circuitry. In this study, the effects of pulse plating parameters and different shaped waveforms on the quality of microvias have been investigated. The results showed that, within the scope of this study, the reverse current cycle time has little effect on throwing power. Indeed, a decrease in forward current, or an increase in reverse current could significantly improve the throwing power. The study also found that using a triangular, instead of the traditional rectangular waveform, could increase the throwing power further, with a more uniform distribution of copper plating. Finally, the advantage of the cathode vibrating during plating was demonstrated.
Keywords
cathodes; copper; current density; electroplating; metallisation; printed circuit manufacture; vibrations; Cu; Cu plating distribution; PCB manufacture; cathode vibrating; high-density circuitry; microvias; printed circuit boards; pulse plating parameters; reverse current cycle time; shaped waveforms; throwing power; Cathodes; Copper; Current density; Dielectric liquids; Dielectric substrates; Laser ablation; Manufacturing industries; Metallization; Printed circuits; Pulse shaping methods;
fLanguage
English
Journal_Title
Electronics Packaging Manufacturing, IEEE Transactions on
Publisher
ieee
ISSN
1521-334X
Type
jour
DOI
10.1109/TEPM.2003.817722
Filename
1236874
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