DocumentCode :
803561
Title :
The effects of pulse plating parameters on copper plating distribution of microvia in PCB manufacture
Author :
Yung, K.C. ; Yue, T.M. ; Chan, K.C. ; Yeung, K.F.
Author_Institution :
Dept. of Ind. & Syst. Eng., Hong Kong Polytech.s Univ., Kowloon, China
Volume :
26
Issue :
2
fYear :
2003
fDate :
4/1/2003 12:00:00 AM
Firstpage :
106
Lastpage :
109
Abstract :
The introduction of microvias to printed circuit boards has revolutionized the entire printed circuit board (PCB) industry. In many instances, the plating of microvias creates a bottleneck in the manufacture of high-density circuitry. In this study, the effects of pulse plating parameters and different shaped waveforms on the quality of microvias have been investigated. The results showed that, within the scope of this study, the reverse current cycle time has little effect on throwing power. Indeed, a decrease in forward current, or an increase in reverse current could significantly improve the throwing power. The study also found that using a triangular, instead of the traditional rectangular waveform, could increase the throwing power further, with a more uniform distribution of copper plating. Finally, the advantage of the cathode vibrating during plating was demonstrated.
Keywords :
cathodes; copper; current density; electroplating; metallisation; printed circuit manufacture; vibrations; Cu; Cu plating distribution; PCB manufacture; cathode vibrating; high-density circuitry; microvias; printed circuit boards; pulse plating parameters; reverse current cycle time; shaped waveforms; throwing power; Cathodes; Copper; Current density; Dielectric liquids; Dielectric substrates; Laser ablation; Manufacturing industries; Metallization; Printed circuits; Pulse shaping methods;
fLanguage :
English
Journal_Title :
Electronics Packaging Manufacturing, IEEE Transactions on
Publisher :
ieee
ISSN :
1521-334X
Type :
jour
DOI :
10.1109/TEPM.2003.817722
Filename :
1236874
Link To Document :
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