DocumentCode
803894
Title
Microstructure of Sputtered High-Coercive Fe-Pt Alloy Thin Films
Author
Watanabe, M. ; Nakayama, T. ; Watanabe, K. ; Hiraga, K.
Author_Institution
The Research Institute for Electric and Magnetic Materials
Volume
8
Issue
12
fYear
1993
Firstpage
875
Lastpage
880
Abstract
Fe-Pt alloy thin films were prepared by the rf-magnetron sputtering method. From X-ray diffraction results and TEM observations, the following results were obtained: (1) the as-deposited films are disordered and consist of micrograins of size roughly 150~200 Ã
; (2) the annealed films are ordered, with grain sizes about 400~500 Ã
. A lamellar microstructure, which is considered to be a microtwin structure, was observed within the grains. Magnetization measurements revealed that the coercive force, Hc , of the annealed films has a maximum (¿15.8 kOe) at about equiatomic concentration. The origin of the high Hc is considered to be related to the microtwin structure. It was found that Hc begins to increase at an annealing temperature of 300°C, which means that the ordered phase begins to grow at the same temperature. The magnetization, M, of the annealed films was smaller than that of as-deposited films. The decrease in M near equiatomic composition is ascribed to a change in the magnetic structure.
Keywords
Annealing; Coercive force; Force measurement; Grain size; Magnetic films; Magnetization; Microstructure; Sputtering; Temperature; X-ray diffraction;
fLanguage
English
Journal_Title
Magnetics in Japan, IEEE Translation Journal on
Publisher
ieee
ISSN
0882-4959
Type
jour
DOI
10.1109/TJMJ.1993.4565765
Filename
4565765
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