DocumentCode
803930
Title
Very Thin Silicon Steel Tertiary Recrystallized by Continuous Annealing Method
Author
Ohkawa, M. ; Kim, Y.H. ; Ishiyama, K. ; Arai, K.I.
Author_Institution
Tohoku University.
Volume
8
Issue
12
fYear
1993
Firstpage
901
Lastpage
905
Abstract
It is well known that very thin grain-oriented silicon steel sheet has a very low iron loss. A continuous annealing method was used to obtain a long (over 1 m) thin grain-oriented silicon steel sheet. As a result, thin grain-oriented silicon steel sheet 40 ¿m thick and 1 m long was obtained. The annealing temperature was 1423K and the sample speed was from 0.7 to 2.1 mm/s. The annealing time needed to complete the recrystallization of (110) [001] grains was only a few minutes. However, the grain size of the sample was not uniform. As a result, the magnetic properties depend on the position of the sample.
Keywords
Annealing; Building materials; Furnaces; Heat treatment; Infrared heating; Iron; Sheet materials; Silicon; Steel; Temperature;
fLanguage
English
Journal_Title
Magnetics in Japan, IEEE Translation Journal on
Publisher
ieee
ISSN
0882-4959
Type
jour
DOI
10.1109/TJMJ.1993.4565769
Filename
4565769
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