• DocumentCode
    803930
  • Title

    Very Thin Silicon Steel Tertiary Recrystallized by Continuous Annealing Method

  • Author

    Ohkawa, M. ; Kim, Y.H. ; Ishiyama, K. ; Arai, K.I.

  • Author_Institution
    Tohoku University.
  • Volume
    8
  • Issue
    12
  • fYear
    1993
  • Firstpage
    901
  • Lastpage
    905
  • Abstract
    It is well known that very thin grain-oriented silicon steel sheet has a very low iron loss. A continuous annealing method was used to obtain a long (over 1 m) thin grain-oriented silicon steel sheet. As a result, thin grain-oriented silicon steel sheet 40 ¿m thick and 1 m long was obtained. The annealing temperature was 1423K and the sample speed was from 0.7 to 2.1 mm/s. The annealing time needed to complete the recrystallization of (110) [001] grains was only a few minutes. However, the grain size of the sample was not uniform. As a result, the magnetic properties depend on the position of the sample.
  • Keywords
    Annealing; Building materials; Furnaces; Heat treatment; Infrared heating; Iron; Sheet materials; Silicon; Steel; Temperature;
  • fLanguage
    English
  • Journal_Title
    Magnetics in Japan, IEEE Translation Journal on
  • Publisher
    ieee
  • ISSN
    0882-4959
  • Type

    jour

  • DOI
    10.1109/TJMJ.1993.4565769
  • Filename
    4565769