DocumentCode :
803930
Title :
Very Thin Silicon Steel Tertiary Recrystallized by Continuous Annealing Method
Author :
Ohkawa, M. ; Kim, Y.H. ; Ishiyama, K. ; Arai, K.I.
Author_Institution :
Tohoku University.
Volume :
8
Issue :
12
fYear :
1993
Firstpage :
901
Lastpage :
905
Abstract :
It is well known that very thin grain-oriented silicon steel sheet has a very low iron loss. A continuous annealing method was used to obtain a long (over 1 m) thin grain-oriented silicon steel sheet. As a result, thin grain-oriented silicon steel sheet 40 ¿m thick and 1 m long was obtained. The annealing temperature was 1423K and the sample speed was from 0.7 to 2.1 mm/s. The annealing time needed to complete the recrystallization of (110) [001] grains was only a few minutes. However, the grain size of the sample was not uniform. As a result, the magnetic properties depend on the position of the sample.
Keywords :
Annealing; Building materials; Furnaces; Heat treatment; Infrared heating; Iron; Sheet materials; Silicon; Steel; Temperature;
fLanguage :
English
Journal_Title :
Magnetics in Japan, IEEE Translation Journal on
Publisher :
ieee
ISSN :
0882-4959
Type :
jour
DOI :
10.1109/TJMJ.1993.4565769
Filename :
4565769
Link To Document :
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