• DocumentCode
    804288
  • Title

    Tb-Fe Sputtered Films with Large Magnetostriction for Use in Magnetomechanical Thin-Film Devices

  • Author

    Hayashi, Y. ; Honda, T. ; Yamaguchi, M. ; Arai, K.I.

  • Author_Institution
    Tohoku University
  • Volume
    9
  • Issue
    1
  • fYear
    1994
  • Firstpage
    124
  • Lastpage
    128
  • Abstract
    We examined the magnetostriction and coercive force of amorphous Tb-Fe films sputter-deposited under different conditions (rf input power, Ar gas pressure, Tb content, etc.). Here we discuss the possibility of obtaining both soft magnetic properties and a large magnetostriction in this system. Soft magnetic properties and large magnetostriction were obtained simultaneously in sputtered Tb-Fe thin films prepared with a Tb content of 45 to 50 at%, under an Ar gas pressure of 4 mTorr and with an rf input power of 200 W. This material has strong potential for use in magnetomechanical thin-film devices.
  • Keywords
    Amorphous magnetic materials; Argon; Magnetic devices; Magnetic films; Magnetic properties; Magnetostriction; Magnetostrictive devices; Soft magnetic materials; Sputtering; Thin film devices;
  • fLanguage
    English
  • Journal_Title
    Magnetics in Japan, IEEE Translation Journal on
  • Publisher
    ieee
  • ISSN
    0882-4959
  • Type

    jour

  • DOI
    10.1109/TJMJ.1994.4565804
  • Filename
    4565804