Title :
Novel Low-Resistance Current Path UMOS With High-K Dielectric Pillars
Author :
Xiao Rong Luo ; Jin Yong Cai ; Ye Fan ; Yuan Hang Fan ; Xiao Wei Wang ; Jie Wei ; Yong Heng Jang ; Kun Zhou ; Chao Yin ; Bo Zhang ; Zhao Ji Li ; Gangyi Hu
Author_Institution :
State Key Lab. of Electron. Thin Films & Integrated Devices, Univ. of Electron. Sci. & Technol. of China, Chengdu, China
Abstract :
A low specific on-resistance (Ron,sp) UMOS with high permittivity (HK) dielectric pillars underneath the p body region (HK UMOS) is proposed and investigated. Its drift region uniquely consists of two narrow and highly-doped n pillars and one lightly doped n- pillar, which is parallel to the HK dielectric pillars. First, the highly-doped n pillars offer low resistance current paths in the ON-state while the n- region sustains high voltage in the OFF-state. Second, the HK dielectric causes an enhanced self-adapted lateral assistant depletion of the n pillars, which allows to keep a higher doping concentration of the n pillars and thus further reduces the Ron,sp. Third, the HK dielectric enhances the vertical field strength in high-voltage blocking state, leading to an improved breakdown voltage (BV). Compared with a conventional UMOS at the highest figure-of-merit, the HK UMOS with kD=200 not only decreases the Ron,sp by 67%, but also increases the BV by 12%.
Keywords :
MOSFET; electric breakdown; semiconductor doping; BV; HK UMOS; MOSFET; breakdown voltage; doping concentration; figure-of- merit; high permittivity dielectric pillar; high-k dielectric pillar; high-voltage blocking state; highly-doped n pillar; low specific on-resistance current path UMOS; narrow n pillar; p body region; self-adapted lateral assistant depletion; vertical field strength; Dielectrics; Doping; Electrodes; Epitaxial growth; Logic gates; Permittivity; Silicon; Breakdown voltage (BV); UMOS; dielectric; high relative permittivity; specific on-resistance;
Journal_Title :
Electron Devices, IEEE Transactions on
DOI :
10.1109/TED.2013.2272086