DocumentCode
804861
Title
Suppression of fringe diffraction in localized holographic exposure for DFB laser arrays
Author
Talneau, A. ; Chandouineau, J.P. ; Charil, J. ; Ougazzaden, A.
Author_Institution
Lab. de Bagneux, CNET, Bagneux, France
Volume
7
Issue
7
fYear
1995
fDate
7/1/1995 12:00:00 AM
Firstpage
721
Lastpage
723
Abstract
A six-wavelength MQW DFB laser array emitting around 1.55 μm realized in a single holographic lithography is described. Fringe-free localized grating isolation is attained using a mask with a novel aperture-edge design. The first-order grating periods as well as the ridge locations can be varied in a large span. The high throughput of holographic lithography is extended to multiwavelength DFB arrays.
Keywords
distributed feedback lasers; holographic gratings; holographic interferometry; photolithography; quantum well lasers; semiconductor laser arrays; 1.55 mum; aperture-edge design; first-order grating periods; fringe diffraction suppression; fringe-free localized grating isolation; high throughput; localized holographic exposure; mask; multiwavelength DFB arrays; ridge locations; single holographic lithography; six-wavelength MQW DFB laser array; Apertures; Diffraction; Etching; Fiber lasers; Gratings; Holography; Lithography; Optical arrays; Shape; Throughput;
fLanguage
English
Journal_Title
Photonics Technology Letters, IEEE
Publisher
ieee
ISSN
1041-1135
Type
jour
DOI
10.1109/68.393185
Filename
393185
Link To Document