Title :
Suppression of fringe diffraction in localized holographic exposure for DFB laser arrays
Author :
Talneau, A. ; Chandouineau, J.P. ; Charil, J. ; Ougazzaden, A.
Author_Institution :
Lab. de Bagneux, CNET, Bagneux, France
fDate :
7/1/1995 12:00:00 AM
Abstract :
A six-wavelength MQW DFB laser array emitting around 1.55 μm realized in a single holographic lithography is described. Fringe-free localized grating isolation is attained using a mask with a novel aperture-edge design. The first-order grating periods as well as the ridge locations can be varied in a large span. The high throughput of holographic lithography is extended to multiwavelength DFB arrays.
Keywords :
distributed feedback lasers; holographic gratings; holographic interferometry; photolithography; quantum well lasers; semiconductor laser arrays; 1.55 mum; aperture-edge design; first-order grating periods; fringe diffraction suppression; fringe-free localized grating isolation; high throughput; localized holographic exposure; mask; multiwavelength DFB arrays; ridge locations; single holographic lithography; six-wavelength MQW DFB laser array; Apertures; Diffraction; Etching; Fiber lasers; Gratings; Holography; Lithography; Optical arrays; Shape; Throughput;
Journal_Title :
Photonics Technology Letters, IEEE
