DocumentCode :
804959
Title :
High field poling of electrooptic etalon modulators on CMOS integrated circuits
Author :
Kowel, S.T. ; Wang, S. ; Thomsen, A. ; Chan, W. ; Leslie, T.M. ; Wang, N.P.
Author_Institution :
Dept. of Electr. & Comput. Eng., Alabama Univ., Huntsville, AL, USA
Volume :
7
Issue :
7
fYear :
1995
fDate :
7/1/1995 12:00:00 AM
Firstpage :
754
Lastpage :
756
Abstract :
Reflection etalon modulators with electrooptic polymer layers as the spacer have been fabricated on the surface of a CMOS chip and successfully poled under a dc electric field at 80 V/μm. This is the first demonstration that such etalons can be fabricated on finished VLSI circuits and poled successfully without damage to the electronics while connected to the underlying circuitry. Such modulators, fabricated on the surface of integrated circuits, have potential applications in areas such as optical communication and free-space interconnects for multiprocessors.
Keywords :
CMOS integrated circuits; VLSI; electro-optical modulation; integrated optoelectronics; optical fabrication; CMOS integrated circuits; VLSI; chip surface; electronics; electrooptic modulators; fabrication; free-space interconnects; high field poling; multiprocessors; optical communication; polymer spacer layers; reflection etalons; CMOS integrated circuits; Electrooptic modulators; Fabrication; Integrated circuit interconnections; Nonlinear optics; Optical arrays; Optical materials; Photonic integrated circuits; Polymers; Very large scale integration;
fLanguage :
English
Journal_Title :
Photonics Technology Letters, IEEE
Publisher :
ieee
ISSN :
1041-1135
Type :
jour
DOI :
10.1109/68.393195
Filename :
393195
Link To Document :
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