Duoplasmatron Ion Sources

A survey on questions related to the production of multiply charged ions with the Duoplasmatron ion source is given. In spite of differences of the multiply charged ion source and the mass separator type, design considerations show that high containment is a common feature to be attained in both subjects. Multiply charged metal ions are produced by material evaporation into the magnetically confined anodic plasma and auxiliary gas feed into the cathode discharge regions. Energy spreads of ion beams from the low and the high arc current source are compared. The Duoplasmatron ion source proves to be a hygieneous source of high containment that permits the production of medium charge states up to 9+ for xenon at modest energy spread and good brilliance of the extracted ion beam in a high current-low voltage discharge mode.