Title :
Process harmonic pulling in RIE plasma-tool
Author :
Pagliarani, A. ; Kenyon, A.J. ; Thornhill, N.F. ; Sirisena, E. ; Lee, K. ; Law, V.J.
Author_Institution :
Dept. of Electron. & Electr. Eng., Univ. Coll. London, UK
Abstract :
Harmonic response to oxygen plasma etching of photoresist in an RIE plasma-tool is reported. Harmonic amplitude and phase delay exhibit a step-change at the end-point, suggesting sensitivity to flux of etching products, and a gradual frequency drift response to a process end-point is interpreted as a response to changing photoresist thickness.
Keywords :
harmonic analysis; photoresists; plasma probes; sputter etching; RIE plasma-tool; frequency drift response; harmonic amplitude; harmonic response; phase delay; photoresist; plasma etching; process harmonic pulling;
Journal_Title :
Electronics Letters
DOI :
10.1049/el:20064133
