Electron-Bombardment Type Simplified Source for High Temperature Operation and the Production of Multiply-Charged Ions Utilizing Beam-Plasma Interactions

Some properties of an electron-bombardment type simplified ion source for high temperature operation to obtain heavy ions are studied. And some properties of a multiply-charged ion source of the two stages, which is constructed of the simplified ion source and the beam-plasma type ion source developed by the present authors, are also studied. In the simplified ion source we utilize the magnetic field induced by the filament coil effectively, so that there is no external magnetic coil. The discharge chamber can be designed very small. It is easy to raise the temperature of the discharge chamber higher than 1200°C and is possible to operate stably at high temperatures. It is shown that several metal ions can be obtained easily and sufficiently from materials in solid states at a room temperature. A multiply-charged ion source of two stages is developed. For the first stage the simplified ion source is used to provide singly-charged ions for the beam-plasma discharge field. In the second stage the beam-plasma discharge is used to produce multiply-charged ions efficiently. A high degree of electron stripping of ions occurs in the presence of energetic electrons of high density generated by beam-plasma discharge due to the beam-plasma interactions. Some properties of this source are studied. The properties of a newly-designed simplified ion source of electron-bombardment type are presented in the first place. Secondly the features of a multiply-charged ion source of two stages are presented.