DocumentCode :
807194
Title :
Loss measurement and analysis of high-silica reflection bending optical waveguides
Author :
Himeno, Akira ; Terui, Hiroshi ; Kobayashi, Morio
Author_Institution :
Electr. Commun. Labs., NTT, Ibaraki, Japan
Volume :
6
Issue :
1
fYear :
1988
fDate :
1/1/1988 12:00:00 AM
Firstpage :
41
Lastpage :
46
Abstract :
Bending loss of high-silica single-mode bending optical waveguides using a waveguide side-wall as a reflecting facet is described theoretically and experimentally as a function of the bending angle. Two types of bending waveguides, which have the reflecting facet exposed to the air coated with a metal film, are treated. The causes of bending loss are discussed in terms of los due to the Goos-Hanchen effect and the perpendicularity and roughness of the reflecting facet
Keywords :
bending; light reflection; loss measurement; optical losses; optical variables measurement; optical waveguides; silicon compounds; Goos-Hanchen effect; bending angle; bending loss; bending waveguides; facet perpendicularity; facet roughness; high SiO2; high-silica reflection bending optical waveguides; loss measurement; metal film; reflecting facet; waveguide side-wall; Etching; Loss measurement; Optical devices; Optical films; Optical losses; Optical reflection; Optical waveguide components; Optical waveguide theory; Optical waveguides; Semiconductor waveguides;
fLanguage :
English
Journal_Title :
Lightwave Technology, Journal of
Publisher :
ieee
ISSN :
0733-8724
Type :
jour
DOI :
10.1109/50.3961
Filename :
3961
Link To Document :
بازگشت