DocumentCode :
807694
Title :
Device Degrdation from the Effects of Nuclear Radiation on Passivation Materials
Author :
Coppage, F.N. ; Graham, E.D., Jr.
Author_Institution :
Sandia Laboratories Albuquerque, New Mexico 87115
Volume :
19
Issue :
6
fYear :
1972
Firstpage :
320
Lastpage :
324
Abstract :
Devices that utilized three different commercial passivation processes were studied in a nuclear radiation environment to determine if the passivation process influences the radiation tolerance of the device. Comparisons were made between devices obtained from the same manufacturer. The passivation processes studied featured silicon dixoide, silicon nitride and aluminum oxide. Irradiations were performed with the devices in both a biased and unbiased mode. The results show that the device with silicon dioxide passivation degraded the most. The nitride devices having beam leads showed no saturation of the induced degradation while the other processes did for a dose of 1 × 107 (Si). All devices studied showed a small bias dependence. The addition of an aluminum oxide or silicon nitride passivation layer (over the silicon dioxide surface) for an increased reliability definitely induces no increased radiation degradation.
Keywords :
Aluminum oxide; Degradation; Fabrication; Geometrical optics; Gold; Insulation; Manufacturing; Passivation; Silicon compounds; Surface cleaning;
fLanguage :
English
Journal_Title :
Nuclear Science, IEEE Transactions on
Publisher :
ieee
ISSN :
0018-9499
Type :
jour
DOI :
10.1109/TNS.1972.4326851
Filename :
4326851
Link To Document :
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