Title :
A study on the field distribution of thin-film heads
Author :
Takano, Hisashi ; Shinada, Hiroyuki ; Seitou, Shigemitsu ; Fukuhara, Satoru ; Ohnishi, Tsuyoshi ; Otomo, Shigekazu ; Todokoro, Hideo ; Shiiki, Kazuo
Author_Institution :
Hitachi Ltd., Tokyo, Japan
fDate :
3/1/1992 12:00:00 AM
Abstract :
The field distribution of a thin-film inductive head and its relationship to pole configurations are examined. Three components of the field distribution at high frequencies are measured using a newly developed electron beam tomography method. Focused ion beam etching is used for the processing of the pole configuration. A comparison between the measured field distribution and the results of three-dimensional computer simulation shows that a sharp field distribution suitable for high-density recording is produced to promote magnetization at the tip region. Furthermore, the optimum design of the pole configuration clarifies the feasibility of 1-μm track recording
Keywords :
computerised tomography; digital simulation; electron beam applications; magnetic field measurement; magnetic heads; magnetic recording; magnetic thin film devices; 1 micron; electron beam tomography method; field distribution; focused ion beam etching; high-density recording; magnetization; pole configuration optimum design; thin-film inductive head; three-dimensional computer simulation; Computer simulation; Electron beams; Etching; Frequency measurement; Ion beams; Magnetic field measurement; Magnetic heads; Magnetization; Tomography; Transistors;
Journal_Title :
Magnetics, IEEE Transactions on
