Analysis of metal-ferrite interface layers in metal-in-gap heads

Author

Kajiwara, K. ; Hayakawa, N. ; Kunito, Y. ; Ikeda, Y. ; Hayashi, K. ; Aso, K. ; Ishida, T.

Author_Institution

Sony Corp. Res. Center, Yokohama, Japan

Volume

26

Issue

6

fYear

1990

fDate

11/1/1990 12:00:00 AM

Firstpage

2978

Lastpage

2982

Abstract

A metal-in-gap head structure in which the metal/ferrite interface is perfectly parallel to the main gap face was adopted for mass-production. An analysis of a pseudo-gap formed at the metal-ferrite interface by using sputter-assisted Auger electron spectroscopy is reported. In the case of a Sendust MIG head, it is confirmed that the pseudo-gap is a reacted layer at the metal-ferrite interface, which consists of Al₂O₃+SiO₂. The reaction mechanism is examined in the case of Sendust/MnZn-ferrite and a soft magnetic alloy, called Sofmax, and suitable barrier materials and thickness ranges. It is found that the reacted layer is reduced drastically by using a SiO₂ or SiN₂O 5-10 nm thick ultrathin barrier layer and Sofmax alloy film instead of Sendust. The ripple of a parallel-type metal-in-gap heads is found to be 0.5 dB or less

Keywords

Auger effect; ferrite applications; interface phenomena; magnetic heads; sputtering; surface chemistry; MnZnFe₂O₄; Sendust MIG head; SiO₂; SiON₂; Sofmax; barrier materials; mass-production; metal-ferrite interface layers; metal-in-gap heads; pseudo-gap; reacted layer; ripple; soft magnetic alloy; sputter-assisted Auger electron spectroscopy; ultrathin barrier layer; Electrons; Ferrite films; Magnetic analysis; Magnetic cores; Magnetic films; Magnetic heads; Magnetic materials; Magnetic recording; Saturation magnetization; Soft magnetic materials;

fLanguage

English

Journal_Title

Magnetics, IEEE Transactions on

Publisher

ieee

ISSN

0018-9464

Type

jour

DOI

10.1109/20.102876

Filename

102876