• DocumentCode
    809332
  • Title

    Diffusion and tunneling currents in GaN/InGaN multiple quantum well light-emitting diodes

  • Author

    Cao, X.A. ; Stokes, E.B. ; Sandvik, P.M. ; LeBoeuf, S.F. ; Kretchmer, J. ; Walker, D.

  • Author_Institution
    Semicond. Technol. Lab., GE Res. Center, Niskayuna, NY, USA
  • Volume
    23
  • Issue
    9
  • fYear
    2002
  • Firstpage
    535
  • Lastpage
    537
  • Abstract
    We have studied the electrical characteristics and optical properties of GaN/InGaN multiple quantum well (MQW) light-emitting diodes (LEDs) grown by metalorganic chemical vapor deposition. It appears that there is an essential link between material quality and the mechanism of current transport through the wide-bandgap p-n junction. Tunneling behavior dominates throughout all injection regimes in a device with a high density of defects in the space-charge region, which act as deep-level carrier traps. However, in a high-quality LED diode, temperature-dependent diffusion-recombination current has been identified with an ideality factor of 1.6 at moderate biases. Light output has been found to follow a power law, i.e., L /spl prop/ I/sup m/ in both devices. In the high-quality LED, nonradiative recombination centers are saturated at current densities as low as 1.4 /spl times/ 10/sup -2/ A/cm/sup 2/. This low saturation level indicates that the defects in GaN, especially the high density of edge dislocations, are generally optically inactive.
  • Keywords
    III-V semiconductors; MOCVD coatings; deep levels; dislocation density; edge dislocations; electron-hole recombination; gallium compounds; indium compounds; light emitting diodes; nonradiative transitions; quantum well devices; space charge; tunnelling; wide band gap semiconductors; GaN-InGaN; GaN/InGaN multiple quantum well light emitting diode; carrier injection; deep level carrier trap; defect density; diffusion current; diffusion-recombination current; edge dislocation; electrical characteristics; ideality factor; material quality; metalorganic chemical vapor deposition; nonradiative recombination; optical properties; space charge region; temperature dependence; tunneling current; wide-bandgap p-n junction; Chemical vapor deposition; Electric variables; Gallium nitride; Light emitting diodes; Optical materials; Optical saturation; P-n junctions; Quantum well devices; Radiative recombination; Tunneling;
  • fLanguage
    English
  • Journal_Title
    Electron Device Letters, IEEE
  • Publisher
    ieee
  • ISSN
    0741-3106
  • Type

    jour

  • DOI
    10.1109/LED.2002.802601
  • Filename
    1028991