Title :
Scalable etched-pillar, AlAs-oxide defined vertical cavity lasers
Author :
Floyd, P.D. ; Thibeault, B.J. ; Coldren, L.A. ; Merz, J.L.
Author_Institution :
Dept. of Electr. & Comput. Eng., California Univ., Santa Barbara, CA, USA
fDate :
1/18/1996 12:00:00 AM
Abstract :
Etched-pillar, bottom-emitting vertical cavity lasers have been fabricated using lateral oxidation of AlAs. The devices have threshold currents as low as 315 μA for a 4 μm×4 μm, three quantum well active region. Using the data and a numerical model the authors extract excess optical and carrier losses and an effective surface recombination velocity for the devices. The data show that size dependent optical scattering persists as the lasers are scaled to smaller sizes, but lateral carrier leakage is suppressed, allowing for scaling of lasers to small sizes to achieve lower threshold currents
Keywords :
III-V semiconductors; aluminium compounds; etching; oxidation; quantum well lasers; surface emitting lasers; surface recombination; 315 muA; AlAs; AlAs-oxide; VCSEL; carrier leakage; carrier losses; etched-pillar bottom-emitting vertical cavity laser; fabrication; lateral oxidation; numerical model; optical losses; optical scattering; quantum well; scaling; surface recombination velocity; threshold current;
Journal_Title :
Electronics Letters
DOI :
10.1049/el:19960050