• DocumentCode
    810819
  • Title

    Longitudinal junction termination technique by multiple floating buried-layers for LDMOST

  • Author

    Cheng, J.B. ; Zhang, B. ; Li, Z.J.

  • Volume
    44
  • Issue
    15
  • fYear
    2008
  • Firstpage
    933
  • Lastpage
    934
  • Abstract
    The longitudinal junction termination technique by multiple floating buried-layers for the lateral double-diffused MOSFET (LDMOST) is presented. In off-state, the space charges in the buried-layers generate a new electric field, and this field reduces the electric field peak at the main junction. The potential contours distribute more uniformly than those of the conventional LDMOST. Simulation results show that the breakdown voltage of the proposed structure is 1776 V, compared to 841 V of the conventional LDMOST with the same 120 m drift length.
  • Keywords
    MOSFET; buried layers; semiconductor device breakdown; space charge; breakdown voltage; lateral double-diffused MOSFET; longitudinal junction termination; multiple floating buried-layers; space charges;
  • fLanguage
    English
  • Journal_Title
    Electronics Letters
  • Publisher
    iet
  • ISSN
    0013-5194
  • Type

    jour

  • DOI
    10.1049/el:20081083
  • Filename
    4568722