DocumentCode :
810819
Title :
Longitudinal junction termination technique by multiple floating buried-layers for LDMOST
Author :
Cheng, J.B. ; Zhang, B. ; Li, Z.J.
Volume :
44
Issue :
15
fYear :
2008
Firstpage :
933
Lastpage :
934
Abstract :
The longitudinal junction termination technique by multiple floating buried-layers for the lateral double-diffused MOSFET (LDMOST) is presented. In off-state, the space charges in the buried-layers generate a new electric field, and this field reduces the electric field peak at the main junction. The potential contours distribute more uniformly than those of the conventional LDMOST. Simulation results show that the breakdown voltage of the proposed structure is 1776 V, compared to 841 V of the conventional LDMOST with the same 120 m drift length.
Keywords :
MOSFET; buried layers; semiconductor device breakdown; space charge; breakdown voltage; lateral double-diffused MOSFET; longitudinal junction termination; multiple floating buried-layers; space charges;
fLanguage :
English
Journal_Title :
Electronics Letters
Publisher :
iet
ISSN :
0013-5194
Type :
jour
DOI :
10.1049/el:20081083
Filename :
4568722
Link To Document :
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