DocumentCode
810819
Title
Longitudinal junction termination technique by multiple floating buried-layers for LDMOST
Author
Cheng, J.B. ; Zhang, B. ; Li, Z.J.
Volume
44
Issue
15
fYear
2008
Firstpage
933
Lastpage
934
Abstract
The longitudinal junction termination technique by multiple floating buried-layers for the lateral double-diffused MOSFET (LDMOST) is presented. In off-state, the space charges in the buried-layers generate a new electric field, and this field reduces the electric field peak at the main junction. The potential contours distribute more uniformly than those of the conventional LDMOST. Simulation results show that the breakdown voltage of the proposed structure is 1776 V, compared to 841 V of the conventional LDMOST with the same 120 m drift length.
Keywords
MOSFET; buried layers; semiconductor device breakdown; space charge; breakdown voltage; lateral double-diffused MOSFET; longitudinal junction termination; multiple floating buried-layers; space charges;
fLanguage
English
Journal_Title
Electronics Letters
Publisher
iet
ISSN
0013-5194
Type
jour
DOI
10.1049/el:20081083
Filename
4568722
Link To Document