DocumentCode :
810911
Title :
A.300 GeV High Quality Electron and Pion Beam at the New Generation Proton Accelerators
Author :
Guiragossian, Z. G. T. ; Rand, R. E. ; Hansen, W. W.
Author_Institution :
High Energy Physics Laboratory
Volume :
20
Issue :
3
fYear :
1973
fDate :
6/1/1973 12:00:00 AM
Firstpage :
483
Lastpage :
487
Abstract :
It is demonstrated that high quality secondary electron beams can be made available with intensities of 108 e/pulse at the new generation proton accelerators. A beam design is presented with the following qualities. 1) Large beam transport acceptance [9.5 ¿ster % ¿p/p (FW), with a momentul bite of ± 2%], 2) good momentum resolution [less than ± 0.3%], 3) good angular resolution [less than ± 0.1 mrad], 4) small final spot size [less than ± 3 mm horizontally and ± 6 mm vertically]; and 5) negligible pion contamination [less than 1 pion in 105 electrons]. All of these qualities are achieved while preserving the valuable electron intensities at production. Using standard beam transport magnets a 300 GeV/c transport system is designed with four focussing stages, the first two of which provide a beam spot of sufficient quality for tagged photon experiments. The optics design is based on a periodic cell structure which includes correction of second order aberrations by means of four weak sextupoles. The synchrotron radiation by electron throughout the transport system is used to advantage, to remove pion contamination at the final beam spot. Pion impurity is null at energies greater than 160 GeV. This high quality transport system can also be used to de} iver a high intensity pion beam [109 - 1010 ¿- per 1013 interacting protons], up to 300 GeV/c. Thus a very versatile facility can be provided for electron and pion experiments at the same installation.
Keywords :
Contamination; Electron beams; Electron optics; Magnets; Mesons; Optical design; Particle beams; Production; Proton accelerators; Pulse generation;
fLanguage :
English
Journal_Title :
Nuclear Science, IEEE Transactions on
Publisher :
ieee
ISSN :
0018-9499
Type :
jour
DOI :
10.1109/TNS.1973.4327156
Filename :
4327156
Link To Document :
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