• DocumentCode
    811213
  • Title

    Comparison of electronic characteristics and thermal resistance for HEMTs grown on GaAs and Si substrates

  • Author

    Yashiro, Hitoshi ; Moritani, A.

  • Volume
    28
  • Issue
    18
  • fYear
    1992
  • Firstpage
    1737
  • Lastpage
    1738
  • Abstract
    HEMTs have been successfully fabricated on silicon and their thermal resistance evaluated for the first time. A maximum transconductance of 330 mS/mm was obtained with 0.8 mu m gate length and 105 mu m width. The thermal resistance of the HEMTs on Si was 36+or-5 degrees /W with total device thickness of 400 mu m, demonstrating that the thermal resistance of GaAs/Si is about half that of GaAs/GaAs.
  • Keywords
    III-V semiconductors; aluminium compounds; gallium arsenide; high electron mobility transistors; silicon; solid-state microwave devices; thermal resistance; 0.8 micron; 330 mS; AlGaAs-GaAs; GaAs substrate; HEMTs; I-V characteristics; Si substrate; electronic characteristics; gate length; maximum transconductance; microwave performance; thermal resistance;
  • fLanguage
    English
  • Journal_Title
    Electronics Letters
  • Publisher
    iet
  • ISSN
    0013-5194
  • Type

    jour

  • DOI
    10.1049/el:19921104
  • Filename
    158564