DocumentCode
811213
Title
Comparison of electronic characteristics and thermal resistance for HEMTs grown on GaAs and Si substrates
Author
Yashiro, Hitoshi ; Moritani, A.
Volume
28
Issue
18
fYear
1992
Firstpage
1737
Lastpage
1738
Abstract
HEMTs have been successfully fabricated on silicon and their thermal resistance evaluated for the first time. A maximum transconductance of 330 mS/mm was obtained with 0.8 mu m gate length and 105 mu m width. The thermal resistance of the HEMTs on Si was 36+or-5 degrees /W with total device thickness of 400 mu m, demonstrating that the thermal resistance of GaAs/Si is about half that of GaAs/GaAs.
Keywords
III-V semiconductors; aluminium compounds; gallium arsenide; high electron mobility transistors; silicon; solid-state microwave devices; thermal resistance; 0.8 micron; 330 mS; AlGaAs-GaAs; GaAs substrate; HEMTs; I-V characteristics; Si substrate; electronic characteristics; gate length; maximum transconductance; microwave performance; thermal resistance;
fLanguage
English
Journal_Title
Electronics Letters
Publisher
iet
ISSN
0013-5194
Type
jour
DOI
10.1049/el:19921104
Filename
158564
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