• DocumentCode
    811531
  • Title

    High Energy Low Intensity Beam Profile Monitor

  • Author

    Chehab, R. ; Ngoc, C.Nguyen

  • Author_Institution
    Laboratoire de l´´Accélérateur Linéaire Université de Paris-Sud, Centre d´´Orsay, Orsay, France
  • Volume
    20
  • Issue
    3
  • fYear
    1973
  • fDate
    6/1/1973 12:00:00 AM
  • Firstpage
    662
  • Lastpage
    664
  • Abstract
    The principle of this monitor - used in beam emittance measurements on transport lines - is based on secondary emission phenomenon in dielectric layers. Thin aluminium strips covered with low density KCI layer are used. Measurements with electron beams in the range 150 to 400 MeV are made with foils and strips in the region of stable operation. Observations upon avalanche multiplications encountered are also reported.
  • Keywords
    Aluminum; Argon; Dielectric measurements; Electron beams; Kirchhoff´s Law; Measurement techniques; Monitoring; Potential energy; Strips; Time factors;
  • fLanguage
    English
  • Journal_Title
    Nuclear Science, IEEE Transactions on
  • Publisher
    ieee
  • ISSN
    0018-9499
  • Type

    jour

  • DOI
    10.1109/TNS.1973.4327210
  • Filename
    4327210
    • Link To Document
    https://search.isc.ac/dl/search/defaultta.aspx?DTC=49&DC=811531