• DocumentCode
    811868
  • Title

    Contact resistance for small contacts [MOSFET]

  • Author

    Cumberbatch, Ellis ; Mahinthakumar, Ganamanikam

  • Author_Institution
    Dept. of Math., Claremont Graduate Sch., CA, USA
  • Volume
    38
  • Issue
    12
  • fYear
    1991
  • fDate
    12/1/1991 12:00:00 AM
  • Firstpage
    2669
  • Lastpage
    2672
  • Abstract
    An asymptotic analysis for current flow to small contacts in MOSFET source/drain regions is obtained. The formula for end resistance is compared with numerical simulations. It shows good agreement for contacts whose width is smaller than half the diffusion width
  • Keywords
    boundary-value problems; contact resistance; insulated gate field effect transistors; semiconductor device models; MOSFET source/drain regions; asymptotic analysis; boundary valve problem; contact resistance; current flow; diffusion width; end resistance; model; numerical simulations; small contacts; Conducting materials; Conductivity; Contact resistance; Electrical resistance measurement; Electrostatics; Laplace equations; MOSFET circuits; Manufacturing processes; Mathematics; Shape;
  • fLanguage
    English
  • Journal_Title
    Electron Devices, IEEE Transactions on
  • Publisher
    ieee
  • ISSN
    0018-9383
  • Type

    jour

  • DOI
    10.1109/16.158689
  • Filename
    158689