DocumentCode :
812129
Title :
MSM waveguide photodetectors optimized for monolithic integration with high electron mobility transistors
Author :
Leary, M.H. ; Ballantyne, J.M.
Author_Institution :
Sch. of Electr. Eng., Cornell Univ., Ithaca, NY, USA
Volume :
13
Issue :
7
fYear :
1995
fDate :
7/1/1995 12:00:00 AM
Firstpage :
1514
Lastpage :
1520
Abstract :
This paper describes the design of two types of MSM photodetectors, one with interdigitated fingers running across a waveguide and one with electrodes running alongside the waveguide ridge. Both detectors employ the same layer structure as well-characterized high electron mobility transistors (HEMT´s) for ease of integration. Resistive loss at the electrode surface, radiation loss into the substrate, and scattering loss are all accounted for in the optimization for internal detection efficiency of these 50 GHz detectors
Keywords :
HEMT integrated circuits; electrodes; integrated optoelectronics; light scattering; metal-semiconductor-metal structures; millimetre wave detectors; optical design techniques; optical losses; optical planar waveguides; optical waveguide components; optimisation; photodetectors; 50 GHz; 50 GHz detectors; MSM photodetector design; MSM waveguide photodetector optimisation; high electron mobility transistors; interdigitated fingers; internal detection efficiency; layer structure; monolithic integration; resistive loss; scattering loss; substrate; waveguide ridge; well-characterized high electron mobility transistors; Detectors; Electrodes; Electron mobility; Geometrical optics; HEMTs; MODFETs; Monolithic integrated circuits; Optical waveguides; PIN photodiodes; Photodetectors;
fLanguage :
English
Journal_Title :
Lightwave Technology, Journal of
Publisher :
ieee
ISSN :
0733-8724
Type :
jour
DOI :
10.1109/50.400720
Filename :
400720
Link To Document :
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