DocumentCode :
812705
Title :
Overestimate of thin dielectric lifetime in single doping type poly-gate capacitors
Author :
Wang, S.J. ; Chen, I.C.
Author_Institution :
Texas Instrum., Dallas, TX
Volume :
38
Issue :
12
fYear :
1991
fDate :
12/1/1991 12:00:00 AM
Firstpage :
2723
Lastpage :
2724
Abstract :
Summary form only given. It is reported that effects of band-bending produce a voltage drop in the poly gate, which reduces the voltage stress across the capacitor dielectric. It was found that if this effect is not taken into account there is a three-orders-of-magnitude overestimate of the 5-V lifetime for a 68-Å oxide equivalent ONO poly/poly capacitor. A family of curves relating poly doping concentration, dielectric thickness, and the maximum allowable accelerated test voltage was given as guidelines for accelerated time-dependent dielectric breakdown testing
Keywords :
capacitors; dielectric thin films; electric breakdown of solids; elemental semiconductors; life testing; metal-insulator-semiconductor devices; semiconductor doping; semiconductor-insulator boundaries; silicon; 5 V; 68 Å; MIS device; ONO poly/poly capacitor; Si; accelerated test voltage; band-bending; dielectric thickness; doping concentration; lifetime overestimation; poly-gate capacitors; polysilicon; thin dielectric lifetime; time-dependent dielectric breakdown testing; voltage drop; voltage stress reduction; Capacitors; Charge pumps; Dielectrics; Doping; Electron traps; Electrooptic effects; MOSFET circuits; Quantization; Surface treatment; Wave functions;
fLanguage :
English
Journal_Title :
Electron Devices, IEEE Transactions on
Publisher :
ieee
ISSN :
0018-9383
Type :
jour
DOI :
10.1109/16.158764
Filename :
158764
Link To Document :
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