• DocumentCode
    812705
  • Title

    Overestimate of thin dielectric lifetime in single doping type poly-gate capacitors

  • Author

    Wang, S.J. ; Chen, I.C.

  • Author_Institution
    Texas Instrum., Dallas, TX
  • Volume
    38
  • Issue
    12
  • fYear
    1991
  • fDate
    12/1/1991 12:00:00 AM
  • Firstpage
    2723
  • Lastpage
    2724
  • Abstract
    Summary form only given. It is reported that effects of band-bending produce a voltage drop in the poly gate, which reduces the voltage stress across the capacitor dielectric. It was found that if this effect is not taken into account there is a three-orders-of-magnitude overestimate of the 5-V lifetime for a 68-Å oxide equivalent ONO poly/poly capacitor. A family of curves relating poly doping concentration, dielectric thickness, and the maximum allowable accelerated test voltage was given as guidelines for accelerated time-dependent dielectric breakdown testing
  • Keywords
    capacitors; dielectric thin films; electric breakdown of solids; elemental semiconductors; life testing; metal-insulator-semiconductor devices; semiconductor doping; semiconductor-insulator boundaries; silicon; 5 V; 68 Å; MIS device; ONO poly/poly capacitor; Si; accelerated test voltage; band-bending; dielectric thickness; doping concentration; lifetime overestimation; poly-gate capacitors; polysilicon; thin dielectric lifetime; time-dependent dielectric breakdown testing; voltage drop; voltage stress reduction; Capacitors; Charge pumps; Dielectrics; Doping; Electron traps; Electrooptic effects; MOSFET circuits; Quantization; Surface treatment; Wave functions;
  • fLanguage
    English
  • Journal_Title
    Electron Devices, IEEE Transactions on
  • Publisher
    ieee
  • ISSN
    0018-9383
  • Type

    jour

  • DOI
    10.1109/16.158764
  • Filename
    158764