• DocumentCode
    812724
  • Title

    Micron-Scale Friction and Sliding Wear of Polycrystalline Silicon Thin Structural Films in Ambient Air

  • Author

    Alsem, Daan Hein ; Dugger, Michael T. ; Stach, Eric A. ; Ritchie, Robert O.

  • Author_Institution
    Mater. Sci. Div., Lawrence Berkeley Nat. Lab., Berkeley, CA
  • Volume
    17
  • Issue
    5
  • fYear
    2008
  • Firstpage
    1144
  • Lastpage
    1154
  • Abstract
    Micron-scale static friction and wear coefficients, surface roughness, and resulting wear debris have been studied for sliding wear in polycrystalline silicon in ambient air at micro- Newton normal loads using on-chip sidewall test specimens, fabricated with the Sandia SUMMiT VTM process. With increasing number of wear cycles friction coefficients increased by a factor of two up to a steady-state regime, concomitant with a decay (after an initial sharp increase) in the wear coefficients and roughness. Wear coefficients were orders of magnitude smaller than reported macroscale values, suggesting that the wear resistance is higher at micrometer dimensions. Based on our observations, a sequence of micron-scale wear mechanisms is proposed involving: 1) a short adhesive wear regime (< 104 cycles), where the oxide is worn away and the first silicon debris particles form and 2) a regime dominated by abrasive wear, where silicon particles (50-100 nm) are created by fracture through the grains (~500 nm). These particles subsequently oxidize and agglomerate into larger debris clusters, while "ploughing" by this debris leads to abrasive grooves associated with local cracking events rather than plastic deformation.
  • Keywords
    elemental semiconductors; micromechanical devices; semiconductor thin films; silicon; sliding friction; surface roughness; wear resistance; Sandia SUMMiT VTM process; Si; ambient air; local cracking events; micron-scale static friction; micron-scale wear mechanisms; plastic deformation; polycrystalline silicon thin structural films; silicon debris particles; size 50 nm to 100 nm; sliding wear; surface roughness; wear coefficients; wear debris; wear resistance; Friction; microelectromechanical systems (MEMS); silicon; thin films; wear;
  • fLanguage
    English
  • Journal_Title
    Microelectromechanical Systems, Journal of
  • Publisher
    ieee
  • ISSN
    1057-7157
  • Type

    jour

  • DOI
    10.1109/JMEMS.2008.927751
  • Filename
    4570966