DocumentCode :
812843
Title :
Control of batch processing systems in semiconductor wafer fabrication facilities
Author :
Gurnani, Haresh ; Anupindi, Ravi ; Akella, Ram
Volume :
5
Issue :
4
fYear :
1992
fDate :
11/1/1992 12:00:00 AM
Firstpage :
319
Lastpage :
328
Abstract :
Loading policies for a batch processing machine, i.e. a machine that can process more than one job at a time, when the arrival times of jobs to the machine are uncertain, are described. The motivation for the study is the structure of process flows and the predominance of batch processing systems in a semiconductor wafer fabrication facility. A two stage serial-batch system with the serial stage (e.g. photolithography) feeding the batch (e.g. furnace) is considered. Machines in the serial stage process one job at a time; further, these machines are subject to failure. A control limit policy for loading the batch machine is assumed, i.e. load if the queue length ⩾Q, else wait until the number of jobs in queue is at least Q. The basic tradeoffs considered are delay (waiting too long) vs. capacity utilization (loading early with very few jobs). An average cost analysis is done and optimized to compute the critical number Q. In an extension to the basic model, the effect of due dates on the critical number is analyzed. Comparison with simulation results is very encouraging
Keywords :
batch processing (industrial); integrated circuit manufacture; production control; queueing theory; semiconductor device manufacture; average cost analysis; batch processing systems; capacity utilization; control limit policy; delay; fabrication facilities; loading policies; model; queue length; semiconductor wafer; serial stage feeding; two stage serial-batch system; Control systems; Cost function; Delay; Fabrication; Furnaces; Job shop scheduling; Lithography; Process control; Semiconductor device manufacture; Semiconductor device modeling;
fLanguage :
English
Journal_Title :
Semiconductor Manufacturing, IEEE Transactions on
Publisher :
ieee
ISSN :
0894-6507
Type :
jour
DOI :
10.1109/66.175364
Filename :
175364
Link To Document :
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