DocumentCode
813340
Title
Recombination within Disordered Regions: Influence of Barrier Height on Recombination Rate and Injection Level Effects
Author
Curtis, O.L., Jr. ; Srour, J.R.
Author_Institution
Northrop Research and Technology Center Hawthorne, California 90250
Volume
20
Issue
6
fYear
1973
Firstpage
196
Lastpage
203
Abstract
Disordered regions are highly effective for recombination in neutron-irradiated silicon and germanium. Extension of an earlier analysis is presented which takes into account the effect of recombination on the local carrier concentration, and qualitatively explains various experimental observations, particularly the variation of lifetime with excess density. Comparisons to Gregory´s impact model are made, and arguments are presented which favor the present analysis. It is observed that the previous conclusion that impurities are unimportant for recombination in neutron-irradiated material may not be valid for practical situations which involve high excess carrier densities.
Keywords
Electrons; Germanium; Laboratories; Neutrons; Potential well; Predictive models; Radiative recombination; Semiconductor impurities; Semiconductor materials; Silicon;
fLanguage
English
Journal_Title
Nuclear Science, IEEE Transactions on
Publisher
ieee
ISSN
0018-9499
Type
jour
DOI
10.1109/TNS.1973.4327393
Filename
4327393
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