• DocumentCode
    813340
  • Title

    Recombination within Disordered Regions: Influence of Barrier Height on Recombination Rate and Injection Level Effects

  • Author

    Curtis, O.L., Jr. ; Srour, J.R.

  • Author_Institution
    Northrop Research and Technology Center Hawthorne, California 90250
  • Volume
    20
  • Issue
    6
  • fYear
    1973
  • Firstpage
    196
  • Lastpage
    203
  • Abstract
    Disordered regions are highly effective for recombination in neutron-irradiated silicon and germanium. Extension of an earlier analysis is presented which takes into account the effect of recombination on the local carrier concentration, and qualitatively explains various experimental observations, particularly the variation of lifetime with excess density. Comparisons to Gregory´s impact model are made, and arguments are presented which favor the present analysis. It is observed that the previous conclusion that impurities are unimportant for recombination in neutron-irradiated material may not be valid for practical situations which involve high excess carrier densities.
  • Keywords
    Electrons; Germanium; Laboratories; Neutrons; Potential well; Predictive models; Radiative recombination; Semiconductor impurities; Semiconductor materials; Silicon;
  • fLanguage
    English
  • Journal_Title
    Nuclear Science, IEEE Transactions on
  • Publisher
    ieee
  • ISSN
    0018-9499
  • Type

    jour

  • DOI
    10.1109/TNS.1973.4327393
  • Filename
    4327393